Used ASML TWINSCAN AT:1150i 193nm ArF Scanner
Used ASML TWINSCAN AT:1150i 193 nm ArF immersion lithography system for 300 mm wafer process development. Ask for configuration, condition and availability.
EQUIPMENT IMAGEThe ASML TWINSCAN AT:1150i is an early-generation 193 nm ArF immersion lithography machine scanner developed for advanced semiconductor process research and immersion lithography evaluation. The system is built on the ASML TWINSCAN platform and supports 300 mm wafer processing.
Originally introduced as an immersion lithography development and pre-production system, the AT:1150i was used for evaluating photoresist materials, immersion-related process behavior, imaging performance and semiconductor lithography applications. It is suitable for research institutes, semiconductor development centers and specialized wafer fabrication projects requiring a 193 nm immersion platform.
ASML AT:1150i Main Specifications
| Manufacturer | ASML |
|---|---|
| Model | TWINSCAN AT:1150i |
| Equipment Type | ArF Immersion Lithography Scanner |
| Exposure Wavelength | 193 nm |
| Numerical Aperture | NA 0.75 |
| Wafer Size | 300 mm |
| Condition | Used Semiconductor Equipment |
| Availability | Subject to current stock and configuration confirmation |
Key Equipment Features
193 nm ArF immersion exposure technology
Designed for 300 mm semiconductor wafer processing
ASML TWINSCAN lithography platform
Suitable for immersion process development and evaluation
Applicable to photoresist, imaging and lithography research
Available as used semiconductor manufacturing equipment
Typical Applications
Depending on the installed configuration and current equipment condition, the used ASML AT:1150i may be considered for semiconductor lithography research, immersion process development, material evaluation, engineering experiments, technical training and other specialized 300 mm wafer projects.
As the AT:1150i was an early immersion development platform, customers should confirm the required process, installed options, software version, laser configuration, facility requirements and equipment condition before purchasing.
Used Equipment Inspection and Supply
The exact configuration of each used ASML lithography system may vary. Available machine information can include equipment photos, serial number, installed modules, current location, operating status and available technical documents.
Support for equipment inspection, dismantling, packaging, international transportation, installation coordination and spare parts sourcing can be discussed according to the project requirements.
Request ASML AT:1150i Information
Contact our team to check the current availability of the used ASML TWINSCAN AT:1150i. Please provide your target application, destination country, required equipment condition and expected installation schedule so that we can review the available configuration.
Contact us for equipment photos, configuration details, inspection status and quotation.
Frequently Asked Questions
Is the ASML AT:1150i a dry or immersion lithography system?
The TWINSCAN AT:1150i is a 193 nm ArF immersion lithography scanner. It uses an immersion medium between the projection optics and the wafer during exposure.
What wafer size does the AT:1150i support?
The ASML TWINSCAN AT:1150i was developed for 300 mm wafer processing.
Is the used AT:1150i currently operational?
The operating condition depends on the individual machine. Current power-on status, completeness, missing components and inspection records should be confirmed before quotation.
Can you provide installation and shipping support?
Equipment inspection, dismantling, packaging, transportation and installation coordination can be evaluated according to the machine location and destination facility.
Have a model or process requirement?
Send it to the semiconductor equipment desk for a focused review.