The Canon FPA-3000i4 is a used i-line stepper in the category of semiconductor lithography machines, designed for wafer exposure and precise pattern transfer. It uses 365 nm i-line illumination and provides a resolution of approximately 0.35 μm.
This available system is configured for 8-inch SEMI wafers with an orientation flat. It includes a Type6-L wafer loader, a Canon standard reticle changer and a CD-80 environmental chamber.
Canon FPA-3000i4 Specifications
| Manufacturer | Canon |
|---|---|
| Model | FPA-3000i4 |
| Equipment Type | i-Line Lithography Stepper |
| Exposure Wavelength | 365 nm i-Line |
| Resolution | 0.35 μm |
| Projection Reduction Ratio | 5:1 |
| Wafer Size | 8-inch SEMI wafer with orientation flat |
| Wafer Loader | TYPE6-L |
| Reticle Size | 6-inch |
| Reticle Changer | Canon Standard Type |
| Chamber Type | CD-80 |
| Condition | Used Semiconductor Equipment |
| Availability | Subject to current stock and inspection |
Main Features
Canon i-line photolithography platform
365 nm exposure wavelength
0.35 μm resolution
5:1 projection reduction ratio
Configured for 8-inch semiconductor wafers
6-inch reticle support
TYPE6-L automatic wafer loader
CD-80 environmental chamber
Typical Applications
The used Canon FPA-3000i4 can be considered for semiconductor wafer fabrication, MEMS production, compound semiconductor processing, power device manufacturing, sensor production and photolithography process development.
Its 365 nm i-line exposure system and 0.35 μm resolution make it suitable for mature semiconductor processes and applications that do not require advanced deep-ultraviolet lithography.
Used Equipment Condition
The exact operating condition, installed options and completeness of this Canon FPA-3000i4 should be confirmed before purchase. Available information may include equipment photos, serial number, current location, operating status, inspection records and included accessories.
Equipment inspection, dismantling, professional packaging, international transportation and installation coordination can be discussed according to the destination and project requirements.
Request Canon FPA-3000i4 Information
Contact us for the current availability, equipment photos, configuration details and quotation for this used Canon FPA-3000i4 i-line lithography stepper.
Please provide your required wafer size, target process, destination country and expected delivery schedule when sending an inquiry.
Frequently Asked Questions
What exposure wavelength does the Canon FPA-3000i4 use?
The Canon FPA-3000i4 is an i-line lithography stepper using a 365 nm exposure wavelength.
What is the resolution of the Canon FPA-3000i4?
The specified resolution is approximately 0.35 μm, depending on the process, resist, reticle and current equipment condition.
What wafer size does this machine support?
This particular system is configured for 8-inch SEMI wafers with an orientation flat.
Is the machine currently operational?
The current operating status and completeness should be confirmed through inspection. Contact us for available test records, equipment photos and configuration information.