Thermco 5200 Horizontal Diffusion Furnace
The Thermco 5200 is a horizontal production diffusion furnace platform for semiconductor, MEMS, photovoltaic and related substrate processing. The available listing identifies the equipment for wafers up to 150 mm in diameter.
The 5200 platform can be configured with two to four independent process tubes. Individual tubes may be assigned to oxidation, diffusion, annealing or compatible LPCVD processes, depending on the installed tube materials, gas systems and exhaust configuration.
Thermco 5200 Main Specifications
| Manufacturer | Thermco Systems |
|---|---|
| Model | 5200 |
| Equipment Type | Horizontal Multi-Tube Diffusion Furnace |
| Maximum Substrate Size | Up to 150 mm |
| Platform Tube Configuration | Two to four process tubes, depending on installed system |
| Maximum Flat Zone | Up to 1,100 mm |
| Published Operating Range | 200–1,350°C, depending on heater and process configuration |
| Heating Zones | Three independently controlled furnace zones |
| Optional Ramp Rate | Up to 25°C per minute with the appropriate fast-ramp option |
| Optional Cooling Rate | Up to 20°C per minute with the appropriate fast-cooling option |
| Process Control | Thermco furnace control system; installed controller version must be confirmed |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock, tube configuration and inspection confirmation |
Key Equipment Features
Horizontal furnace platform supporting wafers up to 150 mm
Configurable two-to-four-tube system architecture
Up to 1,100 mm temperature flat zone
Three independently controlled heating zones
Individual tubes can be configured for different thermal processes
Compatible with manual, semi-automatic or configuration-dependent automated loading
Typical Applications
Published Thermco 5200 applications include wet and dry oxidation, dopant diffusion, forming-gas annealing, high-temperature drive-in and other thermal treatments. Properly configured tubes may also support silicon nitride, polysilicon, TEOS, LTO or related LPCVD processes.
The available machine should only be promoted for processes supported by its installed tube, gas cabinet, pressure system and exhaust equipment. Different tubes in the same mainframe may have different process histories.
Used Equipment Configuration and Inspection
The published specifications describe the configurable 5200 platform. The available used system may contain fewer than four tubes, different heater types, an older control system or process-specific gas and exhaust equipment.
Before quotation, customers should confirm the number of installed tubes, tube dimensions, heater condition, temperature range, quartzware, wafer boats, loading system, gas panels, MFCs, pressure controls, pumps, exhaust treatment and controller version.
Request Thermco 5200 Information
Contact our team to check the current availability of the used Thermco 5200. Please provide your wafer size, intended process, required number of furnace tubes, target temperature range, process gases, destination country and installation schedule.
Contact us for current equipment photos, tube configuration, process history, inspection status and quotation.
Frequently Asked Questions
What wafer size can the Thermco 5200 process?
The published 5200 platform supports semiconductor and related substrates up to 150 mm in diameter.
How many furnace tubes does the Thermco 5200 have?
The platform can be configured with two to four process tubes. The number installed on the available machine must be confirmed.
What processes can the Thermco 5200 perform?
Possible processes include oxidation, diffusion, annealing and selected LPCVD applications. Each installed tube must be checked for its assigned process and gas configuration.
Does every Thermco 5200 operate up to 1,350°C?
The published platform range extends to 1,350°C, but the actual maximum depends on the installed heater, thermocouples, tube materials and process configuration.
