TEL ALPHA 8S Vertical Diffusion Furnace
The Tokyo Electron TEL ALPHA 8S is a vertical batch thermal processing system developed for semiconductor wafer oxidation, annealing and other high-temperature furnace processes. The available equipment listing identifies the platform for both 150 mm and 200 mm wafers.
ALPHA 8S systems were supplied in different process configurations. Depending on the installed furnace tube, gas system, quartzware and control software, an individual machine may be configured for wet oxidation, dry oxidation, annealing or selected LPCVD processes.
TEL ALPHA 8S Main Specifications
| Manufacturer | Tokyo Electron Limited |
|---|---|
| Brand | TEL |
| Model | ALPHA 8S |
| Equipment Type | Vertical Batch Diffusion and Thermal Processing Furnace |
| Supported Wafer Sizes | 150 mm and 200 mm wafers, according to the available listing |
| Wafer Processing | Batch thermal processing |
| Published Process Applications | Wet oxidation, dry oxidation, annealing and configuration-dependent LPCVD |
| Actual Process Configuration | Subject to installed furnace tube, gas panel, quartzware and recipe confirmation |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock, inspection and configuration confirmation |
Key Equipment Features
Vertical batch furnace architecture
Published support for 150 mm and 200 mm wafers
Suitable for semiconductor oxidation and annealing processes
Process capability determined by the installed furnace tube and gas system
Automated wafer loading and recipe control depending on configuration
Typical Applications
The TEL ALPHA 8S may be used for wet or dry thermal oxidation, dopant activation, thermal annealing and other batch furnace processes. Appropriately configured systems may also support silicon, silicon nitride or silicon oxide LPCVD processes.
The exact application should be confirmed from the process designation, furnace tube material, gas cabinet, MFC configuration, exhaust treatment, quartz boat and available process records.
Used Equipment Configuration and Inspection
The ALPHA 8S platform was supplied in multiple process variants, so the model name alone does not identify the installed process. Customers should confirm whether the available machine is configured for oxidation, annealing, diffusion or deposition.
Before quotation, the furnace tube, heater condition, quartzware, wafer boat, loading mechanism, gas panel, MFCs, temperature controllers, exhaust system, software and current power-on status should be inspected.
Request TEL ALPHA 8S Information
Contact our team to check the current availability of the used TEL ALPHA 8S. Please provide your wafer size, target thermal process, required gases, preferred batch configuration, destination country and installation schedule.
Contact us for equipment photos, process configuration, included quartzware, inspection status and quotation.
Frequently Asked Questions
What wafer sizes can the TEL ALPHA 8S process?
The available listing identifies the system for 150 mm and 200 mm wafers. The installed wafer boat and loading hardware must match the required wafer size.
Is every ALPHA 8S configured for the same process?
No. Individual systems may be configured for oxidation, annealing, diffusion or selected deposition processes. The installed tube and gas system must be confirmed.
Can the ALPHA 8S perform wet and dry oxidation?
The platform has been used for wet and dry oxidation, but the required gas delivery, steam-generation equipment and process hardware must be present on the available machine.
What should be inspected before purchasing the furnace?
Important checks include the heater, furnace tube, quartzware, loading mechanism, gas panel, MFCs, temperature control, exhaust system and operating software.
