The DNS SCW60A is a wafer coater and developer intended for photoresist processing in semiconductor photolithography. The available equipment listing identifies it as a 6-inch system with a listed 2C and 2D process configuration.
The machine can be considered for coating photoresist before exposure and developing the wafer after exposure. The exact number and condition of coating bowls, developing modules, thermal units and transfer components should be confirmed on the available machine.
DNS SCW60A Main Specifications
| Manufacturer | DNS |
|---|---|
| Model | SCW60A |
| Alternative Listing Name | DNS SCW60 |
| Equipment Type | Wafer Coater and Developer |
| Supported Wafer Size | 6-inch wafers, according to the available listing |
| Listed Process Configuration | 2C and 2D; actual installed arrangement must be confirmed |
| Primary Process | Photoresist coating and developing |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock and configuration confirmation |
Key Equipment Features
Designed for 150 mm semiconductor wafers
Supports photoresist coating and developing processes
Source listing identifies 2C and 2D process capability
Suitable for integration into established photolithography lines
Used-machine module condition can be reviewed before quotation
Typical Applications
The DNS SCW60A can be used for spin coating photoresist onto 150 mm wafers before exposure. After the exposure step, the developer section removes the appropriate resist regions to form the required lithographic pattern.
Process compatibility depends on the installed coating cups, developer nozzles, resist and chemical lines, hot plates, cool plates, wafer carriers and available recipes.
Used Equipment Configuration and Inspection
The seller-listed 2C and 2D description provides only a basic module indication. It does not confirm the complete process flow, thermal-unit quantity, chemical system, cassette configuration or automation interface of the individual machine.
Before purchase, customers should confirm the model label, serial number, wafer size, coating and developing modules, spin motor operation, robot movement, temperature control, chemical cabinet, exhaust requirements and current power-on status.
Request DNS SCW60A Information
Contact our team to check the current availability of the used DNS SCW60A. Please provide your wafer size, resist and developer requirements, required process flow, destination country and installation schedule.
Contact us for current equipment photos, installed module information, inspection status and quotation.
Frequently Asked Questions
What wafer size does the DNS SCW60A support?
The available listing identifies the system for 6-inch wafers. The cassette and handling configuration should still be confirmed before purchase.
What do the listed 2C and 2D configurations mean?
They indicate coating and developing process capability in the available listing. The precise number, position and condition of the installed process modules must be checked on the machine.
Can the SCW60A run a specific photoresist process?
Compatibility depends on the installed chemical lines, coating cups, dispense system, thermal modules and available recipes. Process requirements should be reviewed before quotation.
Can the operating condition be confirmed from the product listing?
No. The listing identifies the model and basic configuration, but wafer transfer, spin operation, temperature control and chemical delivery require an equipment inspection.
