The DNS SKW80 is a semiconductor coater and developer used in photolithography processes for photoresist coating and post-exposure development. The available equipment listing identifies the platform for 6-inch and 8-inch wafer processing.
The listing references 1C+2D, 2C and 2D process configurations. Because individual used systems may contain different coating bowls, developing modules, thermal units and wafer-handling components, the actual installed configuration should be confirmed before purchase.
DNS SKW80 Main Specifications
| Manufacturer | DNS |
|---|---|
| Model | SKW80 |
| Equipment Type | Wafer Coater and Developer Track System |
| Supported Wafer Sizes | 6-inch and 8-inch wafers, according to the available listing |
| Listed Process Configurations | 1C+2D, 2C or 2D; actual installed modules must be confirmed |
| Primary Process | Photoresist coating and developing |
| Condition | Used semiconductor equipment |
| Availability | Subject to current stock and configuration confirmation |
Key Equipment Features
Designed for 150 mm and 200 mm wafer processing
Suitable for photoresist coating and developing steps
Available listings reference coating and developing module combinations
Applicable to semiconductor photolithography process lines
Actual thermal, transfer and chemical supply configuration can vary
Typical Applications
The DNS SKW80 may be used to apply photoresist before wafer exposure and to develop the resist pattern after exposure. Depending on the installed modules, it may support coating-focused, developing-focused or combined coat-and-develop processing.
Customers should confirm wafer diameter, resist type, developer chemistry, cassette format, process-module condition and compatibility with the intended lithography equipment before selecting a used system.
Used Equipment Configuration and Inspection
The shorthand configurations shown in the source listing do not confirm the complete layout of an individual machine. Coating bowls, developing cups, hot plates, cool plates, wafer robots, chemical cabinets and exhaust connections should be checked against the available unit.
Before quotation, customers should confirm the serial number, controller condition, installed modules, wafer-handling test, chemical delivery system, spin motors, temperature-control units, safety interlocks and current power-on status.
Request DNS SKW80 Information
Contact our team to check the current availability of the used DNS SKW80. Please provide your wafer size, photoresist process, required coating and developing modules, destination country and expected installation schedule.
Contact us for machine photos, installed module details, inspection status and quotation.
Frequently Asked Questions
What wafer sizes can the DNS SKW80 process?
The available listing identifies the SKW80 for 6-inch and 8-inch wafers. The installed cassette, robot end effector and process modules should be checked for the required wafer diameter.
Does every SKW80 include both coating and developing modules?
Not necessarily. The source lists several configurations, including 1C+2D, 2C and 2D. The exact process layout must be confirmed for the individual machine.
Can the SKW80 connect to a lithography exposure system?
Possible integration depends on the wafer interface, factory automation configuration, software communication and the exposure tool being used. These items should be reviewed before installation.
Is the available DNS SKW80 currently operational?
The operating condition cannot be confirmed from the model listing alone. Power-on status, wafer transfer, spin operation, thermal units and chemical delivery should be inspected.
